Rising material costs and uncertain supply chains for gold, nickel, and tin-silver alloys are increasing pressure on the electronics and semiconductor industries. This project demonstrates a promising alternative: electroplated aluminum coatings as a high-performance and cost-efficient solution for selected applications.
The focus is on replacing multi-step metallization processes such as Cu/Ni/Au or Cu/SnAg with a single aluminum-based coating process. This approach reduces process complexity, material consumption, and potentially the cost per wafer significantly. It is particularly attractive for cost-sensitive applications such as consumer electronics, household appliances, solar cells, LED lighting, and entry-level automotive applications.
Fraunhofer ENAS has already successfully demonstrated electroplated aluminum coatings on wafers using ionic liquids at laboratory scale and, together with NB-Technologies GmbH, has developed a process chamber for 200 mm wafers. In addition, the bonding capability for fine-pitch aluminum hybrid bonding at temperatures below 300 °C has been demonstrated.